Single Wafer Thin Film Processing Systems
The NLD-4000 is a stand alone, PC controlled ALD system with LabVIEW software featuring four levels password-controlled user authorization. The system is fully automated and safety-interlocked. It offers flexibility to deposit multiple films such as Al2O3, AlN, TiN, ZrO2, LaO2 and HfO2 for hydrophobic or hard coatings and high-k dielectrics. It has a 12" aluminum reaction chamber with heated walls and a pneumatically lifted top for easy chamber access and cleaning. The system features an onboard gas pod containing up to seven heated 50ml cylinders for precursors and reactants with fast-pulse heated delivery valves using N2 or Ar as a carrier gas. It is designed with minimum process chamber volume for fast cycle time. Options include automatic load-unload (for 6" substrates), ICP source, Ozone generator, and custom chambers for non standard or larger substrates. NLD-4000 is capable of depositing Al2O3 films on 6” wafers with +/- 1Å uniformity.
Brands: NANO-MASTER