Meaglow is developing new plasma technology.
Meaglow Ltd produces a range of custom made plasma sources superior in many respects to ICP sources. The Meaglow hollow cathode design has replaced ICP plasma sources for ALD applications involving nitride deposition with higher growth per cycle and lower oxygen contamination (by orders of magnitude in some cases). The source may also be used for oxides and we have supplied our plasma source for customised conversion of CVD deposition systems.
We also supply a pulsed deposition system, for use at higher temperatures than ALD, but with higher deposition rates (~100 nm/hr).