Visit booth #503
Sputtering, E-beam, Ion Milling, and Hybrid Deposition Systems for R&D and Pilot Production. Static and Rotating Magnetron Sputter Sources for HV and UHV, Substrate Holders with Rotation, RF Biasing, Heating, Cooling, and Tilting; Sputter Targets, Microwave, RF and DC Power Supplies, Microwave Components and Plasma Sources, RF Ion/Plasma Sources.