Please visit us at Booth 409 to discuss your process needs.
Gencoa provides leading edge components and robust process solutions for the thin film community. Our products are developed to meet the ever more stringent demands of today’s coating applications. We specialize in PVD/PACVD sources and process control and monitoring devices for both large area applications and the R&D community. Our latest innovations allow for inexpensive in-situ process gas monitoring as well as precise control over plasma/substrate interactions.
We have a wide range of 2" to 5" circular magnetrons with several magnetic field options as well as an anode layer ion source for pre-treatment, etching, PACVD and PEALD. Speedflo allows control of all reactive sputtering process with both remote and direct plasma monitoring possibilities. Our newest product "Optix" is a gas process monitor which uses a remote plasma generator and plasma emission spectroscopy to monitor process and contaminant gases in-situ from 1x10e-6 mbar to 1x10e-1 mbar without the need for differential pumping.
Brands: Speedflo, GRS, GRS-C, Optix, V-Tech